Silicon technologies ion implantation and thermal treatment /
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Tallennettuna:
| Yhteisötekijä: | |
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| Muut tekijät: | |
| Aineistotyyppi: | Elektroninen E-kirja |
| Kieli: | englanti |
| Julkaistu: |
London : Hoboken, N.J. :
ISTE ; Wiley,
2011.
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| Aiheet: | |
| Linkit: | An electronic book accessible through the World Wide Web; click to view |
| Tagit: |
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| Yhteenveto: | The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. |
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| Ulkoasu: | xvii, 337 p. : ill. |
| Bibliografia: | Includes bibliographical references and index. |