Silicon technologies ion implantation and thermal treatment /
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
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| Format: | Electronic eBook |
| Language: | English |
| Published: |
London : Hoboken, N.J. :
ISTE ; Wiley,
2011.
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| Subjects: | |
| Online Access: | An electronic book accessible through the World Wide Web; click to view |
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| 035 | |a (OCoLC)828672185 | ||
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| 050 | 1 | 4 | |a TK7871.85 |b .S5485 2011eb |
| 082 | 0 | 4 | |a 621.3815/2 |2 22 |
| 245 | 0 | 0 | |a Silicon technologies |h [electronic resource] : |b ion implantation and thermal treatment / |c edited by Annie Baudrant. |
| 260 | |a London : |b ISTE ; |a Hoboken, N.J. : |b Wiley, |c 2011. | ||
| 300 | |a xvii, 337 p. : |b ill. | ||
| 504 | |a Includes bibliographical references and index. | ||
| 520 | |a The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. | ||
| 533 | |a Electronic reproduction. |b Palo Alto, Calif. : |c ebrary, |d 2015. |n Available via World Wide Web. |n Access may be limited to ebrary affiliated libraries. | ||
| 650 | 0 | |a Semiconductor doping. | |
| 650 | 0 | |a Ion implantation. | |
| 650 | 0 | |a Semiconductors |x Heat treatment. | |
| 655 | 7 | |a Electronic books. |2 local | |
| 700 | 1 | |a Baudrant, Annie. | |
| 710 | 2 | |a ebrary, Inc. | |
| 856 | 4 | 0 | |u http://site.ebrary.com/lib/daystar/Doc?id=10660607 |z An electronic book accessible through the World Wide Web; click to view |
| 908 | |a 170314 | ||
| 942 | 0 | 0 | |c EB |
| 999 | |c 153388 |d 153388 | ||