Silicon technologies ion implantation and thermal treatment /
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
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| 格式: | 电子 电子书 |
| 语言: | 英语 |
| 出版: |
London : Hoboken, N.J. :
ISTE ; Wiley,
2011.
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| 在线阅读: | An electronic book accessible through the World Wide Web; click to view |
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| 总结: | The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. |
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| 实物描述: | xvii, 337 p. : ill. |
| 参考书目: | Includes bibliographical references and index. |