Silicon technologies ion implantation and thermal treatment /

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

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Bibliografiske detaljer
Institution som forfatter: ebrary, Inc
Andre forfattere: Baudrant, Annie
Format: Electronisk eBog
Sprog:engelsk
Udgivet: London : Hoboken, N.J. : ISTE ; Wiley, 2011.
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Online adgang:An electronic book accessible through the World Wide Web; click to view
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