High-k gate dielectrics for CMOS technology

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Dades bibliogràfiques
Autor corporatiu: ebrary, Inc
Altres autors: He, Gang, Sun, Zhaoqi
Format: Electrònic eBook
Idioma:anglès
Publicat: Weinheim : Wiley-VCH, 2012.
Matèries:
Accés en línia:An electronic book accessible through the World Wide Web; click to view
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Taula de continguts:
  • pt. 1. Scaling and challenging of Si-based CMOS
  • pt. 2. High-k deposition and materials characterization
  • pt. 3. Challenge in interface engineering and electrode
  • pt. 4. Development in non-Si-based CMOS technology
  • pt. 5. High-k Application in novel devices
  • pt. 6. Challenge and directions.