High-k gate dielectrics for CMOS technology

Saved in:
Bibliografiske detaljer
Institution som forfatter: ebrary, Inc
Andre forfattere: He, Gang, Sun, Zhaoqi
Format: Electronisk eBog
Sprog:engelsk
Udgivet: Weinheim : Wiley-VCH, 2012.
Fag:
Online adgang:An electronic book accessible through the World Wide Web; click to view
Tags: Tilføj Tag
Ingen Tags, Vær først til at tagge denne postø!
Indholdsfortegnelse:
  • pt. 1. Scaling and challenging of Si-based CMOS
  • pt. 2. High-k deposition and materials characterization
  • pt. 3. Challenge in interface engineering and electrode
  • pt. 4. Development in non-Si-based CMOS technology
  • pt. 5. High-k Application in novel devices
  • pt. 6. Challenge and directions.