Cita APA (7th ed.)
ebrary, Inc, He, G., & Sun, Z. (2012). High-k gate dielectrics for CMOS technology. Wiley-VCH.
Cita Chicago (17th ed.)
ebrary, Inc, Gang He, i Zhaoqi Sun. High-k Gate Dielectrics for CMOS Technology. Weinheim: Wiley-VCH, 2012.
Cita MLA (9th ed.)
ebrary, Inc, et al. High-k Gate Dielectrics for CMOS Technology. Wiley-VCH, 2012.
Atenció: Aquestes cites poden no estar 100% correctes.