Ata uhi

Plasma processing and processing science

Whakaatu ērā atu putanga (1)
I tiakina i:
Ngā taipitopito rārangi puna kōrero
Ngā kaituhi rangatōpū: National Research Council (U.S.). Panel on Plasma Processing, National Research Council (U.S.). Naval Studies Board, National Research Council (U.S.). Commission on Physical Sciences, Mathematics, and Applications, ebrary, Inc
Ētahi atu kaituhi: Chen, Francis F., 1929-
Hōputu: Tāhiko īPukapuka
Reo:Ingarihi
I whakaputaina: Washington, D.C. : National Academy Press, 1995.
Rangatū:NRL strategic series.
Ngā marau:
Plasma engineering.
Semiconductors > Etching.
Plasma etching.
Electronic books.
Urunga tuihono:An electronic book accessible through the World Wide Web; click to view
Ngā Tūtohu: Tāpirihia he Tūtohu
Kāore He Tūtohu, Me noho koe te mea tuatahi ki te tūtohu i tēnei pūkete!
Whakaahuatanga
Whakaahutanga tūemi:Committee chair: Francis F. Chen.
This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124.
Whakaahuatanga ōkiko:x, 35 p.

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