Plasma processing and processing science

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Detalles Bibliográficos
Corporate Authors:	National Research Council (U.S.). Panel on Plasma Processing, National Research Council (U.S.). Naval Studies Board, National Research Council (U.S.). Commission on Physical Sciences, Mathematics, and Applications, ebrary, Inc
Outros autores:	Chen, Francis F., 1929-
Formato:	Electrónico eBook
Idioma:	inglés
Publicado:	Washington, D.C. : National Academy Press, 1995.
Series:	NRL strategic series.
Subjects:	Plasma engineering. Semiconductors > Etching. Plasma etching. Electronic books.
Acceso en liña:	An electronic book accessible through the World Wide Web; click to view
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