Plasma processing and processing science

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Detalhes bibliográficos
Corporate Authors:	National Research Council (U.S.). Panel on Plasma Processing, National Research Council (U.S.). Naval Studies Board, National Research Council (U.S.). Commission on Physical Sciences, Mathematics, and Applications, ebrary, Inc
Outros Autores:	Chen, Francis F., 1929-
Formato:	Recurso Electrónico livro electrónico
Idioma:	inglês
Publicado em:	Washington, D.C. : National Academy Press, 1995.
Colecção:	NRL strategic series.
Assuntos:	Plasma engineering. Semiconductors > Etching. Plasma etching. Electronic books.
Acesso em linha:	An electronic book accessible through the World Wide Web; click to view
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