Plasma processing and processing science

Shranjeno v:

Bibliografske podrobnosti
Corporate Authors:	National Research Council (U.S.). Panel on Plasma Processing, National Research Council (U.S.). Naval Studies Board, National Research Council (U.S.). Commission on Physical Sciences, Mathematics, and Applications, ebrary, Inc
Drugi avtorji:	Chen, Francis F., 1929-
Format:	Elektronski eKnjiga
Jezik:	angleščina
Izdano:	Washington, D.C. : National Academy Press, 1995.
Serija:	NRL strategic series.
Teme:	Plasma engineering. Semiconductors > Etching. Plasma etching. Electronic books.
Online dostop:	An electronic book accessible through the World Wide Web; click to view
Oznake:	Označite Brez oznak, prvi označite!

Internet