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Plasma processing and processing science

Sparad:
Institutionella upphov: National Research Council (U.S.). Panel on Plasma Processing, National Research Council (U.S.). Naval Studies Board, National Research Council (U.S.). Commission on Physical Sciences, Mathematics, and Applications, ebrary, Inc
Övriga upphov: Chen, Francis F., 1929-
Materialtyp: Elektronisk E-bok
Språk:engelska
Utgiven: Washington, D.C. : National Academy Press, 1995.
Serie:NRL strategic series.
Ämnen:
Plasma engineering.
Semiconductors > Etching.
Plasma etching.
Electronic books.
Länkar:An electronic book accessible through the World Wide Web; click to view
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Beskrivning:Committee chair: Francis F. Chen.
This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124.
Fysisk beskrivning:x, 35 p.

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