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Plasma processing and processing science

Gorde:
Egile korporatiboa: National Research Council (U.S.). Panel on Plasma Processing, National Research Council (U.S.). Naval Studies Board, National Research Council (U.S.). Commission on Physical Sciences, Mathematics, and Applications, ebrary, Inc
Beste egile batzuk: Chen, Francis F., 1929-
Formatua: Baliabide elektronikoa eBook
Hizkuntza:ingelesa
Argitaratua: Washington, D.C. : National Academy Press, 1995.
Saila:NRL strategic series.
Gaiak:
Plasma engineering.
Semiconductors > Etching.
Plasma etching.
Electronic books.
Sarrera elektronikoa:An electronic book accessible through the World Wide Web; click to view
Etiketak: Etiketa erantsi
Etiketarik gabe, Izan zaitez lehena erregistro honi etiketa jartzen!
Alearen deskribapena:Committee chair: Francis F. Chen.
This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124.
Deskribapen fisikoa:x, 35 p.

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