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Plasma processing and processing science

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Corporate Authors: National Research Council (U.S.). Panel on Plasma Processing, National Research Council (U.S.). Naval Studies Board, National Research Council (U.S.). Commission on Physical Sciences, Mathematics, and Applications, ebrary, Inc
Outros Autores: Chen, Francis F., 1929-
Formato: Recurso Electrónico livro electrónico
Idioma:inglês
Publicado em: Washington, D.C. : National Academy Press, 1995.
Colecção:NRL strategic series.
Assuntos:
Plasma engineering.
Semiconductors > Etching.
Plasma etching.
Electronic books.
Acesso em linha:An electronic book accessible through the World Wide Web; click to view
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Descrição do item:Committee chair: Francis F. Chen.
This work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124.
Descrição Física:x, 35 p.

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