Silicon technologies ion implantation and thermal treatment /
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Guardat en:
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| Format: | Electrònic eBook |
| Idioma: | anglès |
| Publicat: |
London : Hoboken, N.J. :
ISTE ; Wiley,
2011.
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| Matèries: | |
| Accés en línia: | An electronic book accessible through the World Wide Web; click to view |
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| Sumari: | The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. |
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| Descripció física: | xvii, 337 p. : ill. |
| Bibliografia: | Includes bibliographical references and index. |