Silicon technologies ion implantation and thermal treatment /
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Guardado en:
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| Formato: | Electrónico eBook |
| Lenguaje: | inglés |
| Publicado: |
London : Hoboken, N.J. :
ISTE ; Wiley,
2011.
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| Materias: | |
| Acceso en línea: | An electronic book accessible through the World Wide Web; click to view |
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| Sumario: | The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. |
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| Descripción Física: | xvii, 337 p. : ill. |
| Bibliografía: | Includes bibliographical references and index. |