Silicon technologies ion implantation and thermal treatment /

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

Detalles Bibliográficos

Autor Corporativo:	ebrary, Inc
Outros autores:	Baudrant, Annie
Formato:	Electrónico eBook
Idioma:	inglés
Publicado:	London : Hoboken, N.J. : ISTE ; Wiley, 2011.
Subjects:	Semiconductor doping. Ion implantation. Semiconductors > Heat treatment. Electronic books.
Acceso en liña:	An electronic book accessible through the World Wide Web; click to view
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