Silicon technologies ion implantation and thermal treatment /

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

Dades bibliogràfiques

Autor corporatiu:	ebrary, Inc
Altres autors:	Baudrant, Annie
Format:	Electrònic eBook
Idioma:	anglès
Publicat:	London : Hoboken, N.J. : ISTE ; Wiley, 2011.
Matèries:	Semiconductor doping. Ion implantation. Semiconductors > Heat treatment. Electronic books.
Accés en línia:	An electronic book accessible through the World Wide Web; click to view
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