Silicon technologies ion implantation and thermal treatment /
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
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| Formatua: | Baliabide elektronikoa eBook |
| Hizkuntza: | ingelesa |
| Argitaratua: |
London : Hoboken, N.J. :
ISTE ; Wiley,
2011.
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| Sarrera elektronikoa: | An electronic book accessible through the World Wide Web; click to view |
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Silicon technologies ion implantation and thermal treatment /
Argitaratua 2011
An electronic book accessible through the World Wide Web; click to view
Baliabide elektronikoa
eBook