Electromigration in ULSI interconnections
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Main Author: | |
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Corporate Author: | |
Format: | Electronic eBook |
Language: | English |
Published: |
Hackensack, N.J. :
World Scientific,
c2010.
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Series: | International series on advances in solid state electronics and technology.
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Subjects: | |
Online Access: | An electronic book accessible through the World Wide Web; click to view |
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LEADER | 00000nam a2200000 a 4500 | ||
---|---|---|---|
001 | 0000136164 | ||
005 | 20171002061400.0 | ||
006 | m u | ||
007 | cr cn||||||||| | ||
008 | 110308s2010 njuac sb 001 0 eng d | ||
010 | |z 2011280775 | ||
020 | |z 9814273325 | ||
020 | |z 9789814273329 | ||
020 | |z 9789814273336 (e-book) | ||
035 | |a (CaPaEBR)ebr10480052 | ||
035 | |a (OCoLC)714877548 | ||
040 | |a CaPaEBR |c CaPaEBR | ||
050 | 1 | 4 | |a TK7874.76 |b .T36 2010eb |
100 | 1 | |a Tan, Cher Ming, |d 1959- | |
245 | 1 | 0 | |a Electromigration in ULSI interconnections |h [electronic resource] / |c Cher Ming Tan. |
260 | |a Hackensack, N.J. : |b World Scientific, |c c2010. | ||
300 | |a xix, 291 p. : |b ill. (some col.), col. port. | ||
490 | 1 | |a International series on advances in solid state electronics and technology (ASSET) | |
504 | |a Includes bibliographical references and index. | ||
533 | |a Electronic reproduction. |b Palo Alto, Calif. : |c ebrary, |d 2013. |n Available via World Wide Web. |n Access may be limited to ebrary affiliated libraries. | ||
650 | 0 | |a Integrated circuits |x Ultra large scale integration. | |
650 | 0 | |a Electrodiffusion. | |
655 | 7 | |a Electronic books. |2 local | |
710 | 2 | |a ebrary, Inc. | |
830 | 0 | |a International series on advances in solid state electronics and technology. | |
856 | 4 | 0 | |u http://site.ebrary.com/lib/daystar/Doc?id=10480052 |z An electronic book accessible through the World Wide Web; click to view |
908 | |a 170314 | ||
942 | 0 | 0 | |c EB |
999 | |c 125313 |d 125313 |