Computational lithography

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Bibliografske podrobnosti
Glavni avtor:	Ma, Xu, 1983-
Korporativna značnica:	ebrary, Inc
Drugi avtorji:	Arce, Gonzalo R.
Format:	Elektronski eKnjiga
Jezik:	angleščina
Izdano:	Oxford : Wiley-Blackwell, 2010.
Serija:	Wiley series in pure and applied optics.
Teme:	Microlithography > Mathematics. Integrated circuits > Design and construction > Mathematics. Photolithography > Mathematics. Semiconductors > Etching > Mathematics. Resolution (Optics) Electronic books.
Online dostop:	An electronic book accessible through the World Wide Web; click to view
Oznake:	Označite Brez oznak, prvi označite!

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