Computational lithography

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Bibliografiske detaljer
Hovedforfatter:	Ma, Xu, 1983-
Institution som forfatter:	ebrary, Inc
Andre forfattere:	Arce, Gonzalo R.
Format:	Electronisk eBog
Sprog:	engelsk
Udgivet:	Oxford : Wiley-Blackwell, 2010.
Serier:	Wiley series in pure and applied optics.
Fag:	Microlithography > Mathematics. Integrated circuits > Design and construction > Mathematics. Photolithography > Mathematics. Semiconductors > Etching > Mathematics. Resolution (Optics) Electronic books.
Online adgang:	An electronic book accessible through the World Wide Web; click to view
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