CVD solutions for new directions in SiC and GaN epitaxy /

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Bibliografski detalji
Glavni autor: Li, Xun (Autor)
Format: Elektronički e-knjiga
Jezik:engleski
Izdano: Linkoping, Sweden : Semiconductor Materials Division Department of Physics, Chemistry and Biology (IFM), Linkoping University, 2015.
Serija:Linkoping studies in science and technology. Dissertations ; Number 1654.
Teme:
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