Computational lithography
שמור ב:
| מחבר ראשי: | |
|---|---|
| מחבר תאגידי: | |
| מחברים אחרים: | |
| פורמט: | אלקטרוני ספר אלקטרוני |
| שפה: | אנגלית |
| יצא לאור: |
Oxford :
Wiley-Blackwell,
2010.
|
| סדרה: | Wiley series in pure and applied optics.
|
| נושאים: | |
| גישה מקוונת: | An electronic book accessible through the World Wide Web; click to view |
| תגים: |
הוספת תג
אין תגיות, היה/י הראשונ/ה לתייג את הרשומה!
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MARC
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| 008 | 091215s2010 enka sb 001 0 eng d | ||
| 020 | |z 9780470596975 | ||
| 020 | |z 047059697X | ||
| 035 | |a (CaPaEBR)ebr10419114 | ||
| 035 | |a (OCoLC)689995793 | ||
| 040 | |a CaPaEBR |c CaPaEBR | ||
| 050 | 1 | 4 | |a TK7872.M3 |b M3 2010eb |
| 082 | 0 | 4 | |a 621.381531 |2 22 |
| 100 | 1 | |a Ma, Xu, |d 1983- | |
| 245 | 1 | 0 | |a Computational lithography |h [electronic resource] / |c Xu Ma and Gonzalo R. Arce. |
| 260 | |a Oxford : |b Wiley-Blackwell, |c 2010. | ||
| 300 | |a xv, 226 p. : |b ill. | ||
| 490 | 1 | |a Wiley series in pure and applied optics | |
| 504 | |a Includes bibliographical references and index. | ||
| 533 | |a Electronic reproduction. |b Palo Alto, Calif. : |c ebrary, |d 2011. |n Available via World Wide Web. |n Access may be limited to ebrary affiliated libraries. | ||
| 650 | 0 | |a Microlithography |x Mathematics. | |
| 650 | 0 | |a Integrated circuits |x Design and construction |x Mathematics. | |
| 650 | 0 | |a Photolithography |x Mathematics. | |
| 650 | 0 | |a Semiconductors |x Etching |x Mathematics. | |
| 650 | 0 | |a Resolution (Optics) | |
| 655 | 7 | |a Electronic books. |2 local | |
| 700 | 1 | |a Arce, Gonzalo R. | |
| 710 | 2 | |a ebrary, Inc. | |
| 830 | 0 | |a Wiley series in pure and applied optics. | |
| 856 | 4 | 0 | |u http://site.ebrary.com/lib/daystar/Doc?id=10419114 |z An electronic book accessible through the World Wide Web; click to view |
| 908 | |a 170314 | ||
| 942 | 0 | 0 | |c EB |
| 999 | |c 115165 |d 115165 | ||