Atomic layer deposition principles, characteristics, and nanotechnology applications /
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| Main Author: | |
|---|---|
| Corporate Author: | |
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Hoboken, NJ :
John Wiley & Sons,
c2013.
|
| Edition: | 2nd ed. |
| Subjects: | |
| Online Access: | An electronic book accessible through the World Wide Web; click to view |
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| 005 | 20171002063540.0 | ||
| 006 | m o u | ||
| 007 | cr cn||||||||| | ||
| 008 | 130422s2013 njua sb 001 0 eng d | ||
| 010 | |z 2013016209 | ||
| 020 | |z 9781118062777 (cloth : alk. paper) | ||
| 020 | |z 9781118747421 (ebook) | ||
| 035 | |a (CaPaEBR)ebr10715316 | ||
| 035 | |a (OCoLC)841199237 | ||
| 040 | |a CaPaEBR |c CaPaEBR | ||
| 050 | 1 | 4 | |a TS695 |b .K33 2013eb |
| 082 | 0 | 4 | |a 620/.5 |2 23 |
| 100 | 1 | |a Kaariainen, Tommi. | |
| 245 | 1 | 0 | |a Atomic layer deposition |h [electronic resource] : |b principles, characteristics, and nanotechnology applications / |c Tommi Kaariainen ... [et al.]. |
| 250 | |a 2nd ed. | ||
| 260 | |a Hoboken, NJ : |b John Wiley & Sons, |c c2013. | ||
| 300 | |a xv, 253 p. : |b ill. | ||
| 504 | |a Includes bibliographical references and index. | ||
| 533 | |a Electronic reproduction. |b Palo Alto, Calif. : |c ebrary, |d 2013. |n Available via World Wide Web. |n Access may be limited to ebrary affiliated libraries. | ||
| 650 | 0 | |a Chemical vapor deposition. | |
| 650 | 0 | |a Epitaxy. | |
| 650 | 0 | |a Microelectronics. | |
| 650 | 0 | |a Nanotechnology. | |
| 655 | 7 | |a Electronic books. |2 local | |
| 710 | 2 | |a ebrary, Inc. | |
| 856 | 4 | 0 | |u http://site.ebrary.com/lib/daystar/Doc?id=10715316 |z An electronic book accessible through the World Wide Web; click to view |
| 908 | |a 170314 | ||
| 942 | 0 | 0 | |c EB |
| 999 | |c 159091 |d 159091 | ||