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Silicon technologies ion implantation and thermal treatment /

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

I tiakina i:

Ngā taipitopito rārangi puna kōrero
Kaituhi rangatōpū:	ebrary, Inc
Ētahi atu kaituhi:	Baudrant, Annie
Hōputu:	Tāhiko īPukapuka
Reo:	Ingarihi
I whakaputaina:	London : Hoboken, N.J. : ISTE ; Wiley, 2011.
Ngā marau:	Semiconductor doping. Ion implantation. Semiconductors > Heat treatment. Electronic books.
Urunga tuihono:	An electronic book accessible through the World Wide Web; click to view
Ngā Tūtohu:	Tāpirihia he Tūtohu Kāore He Tūtohu, Me noho koe te mea tuatahi ki te tūtohu i tēnei pūkete!

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