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Silicon technologies ion implantation and thermal treatment /

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

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书目详细资料
企业作者:	ebrary, Inc
其他作者:	Baudrant, Annie
格式:	电子电子书
语言:	英语
出版:	London : Hoboken, N.J. : ISTE ; Wiley, 2011.
主题:	Semiconductor doping. Ion implantation. Semiconductors > Heat treatment. Electronic books.
在线阅读:	An electronic book accessible through the World Wide Web; click to view
标签:	添加标签没有标签, 成为第一个标记此记录!

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