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Silicon technologies ion implantation and thermal treatment /

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

-д хадгалсан:

Номзүйн дэлгэрэнгүй
Байгууллагын зохиогч:	ebrary, Inc
Бусад зохиолчид:	Baudrant, Annie
Формат:	Цахим Цахим ном
Хэл сонгох:	англи
Хэвлэсэн:	London : Hoboken, N.J. : ISTE ; Wiley, 2011.
Нөхцлүүд:	Semiconductor doping. Ion implantation. Semiconductors > Heat treatment. Electronic books.
Онлайн хандалт:	An electronic book accessible through the World Wide Web; click to view
Шошгууд:	Шошго нэмэх Шошго байхгүй, Энэхүү баримтыг шошголох эхний хүн болох!

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