High-k gate dielectrics for CMOS technology
Saved in:
| 企業作者: | |
|---|---|
| 其他作者: | , |
| 格式: | 電子 電子書 |
| 語言: | 英语 |
| 出版: |
Weinheim :
Wiley-VCH,
2012.
|
| 主題: | |
| 在線閱讀: | An electronic book accessible through the World Wide Web; click to view |
| 標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
書本目錄:
- pt. 1. Scaling and challenging of Si-based CMOS
- pt. 2. High-k deposition and materials characterization
- pt. 3. Challenge in interface engineering and electrode
- pt. 4. Development in non-Si-based CMOS technology
- pt. 5. High-k Application in novel devices
- pt. 6. Challenge and directions.