High-k gate dielectrics for CMOS technology
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| Autor Corporativo: | |
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| Outros Autores: | , |
| Formato: | Recurso Electrónico livro electrónico |
| Idioma: | inglês |
| Publicado em: |
Weinheim :
Wiley-VCH,
2012.
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| Assuntos: | |
| Acesso em linha: | An electronic book accessible through the World Wide Web; click to view |
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Sumário:
- pt. 1. Scaling and challenging of Si-based CMOS
- pt. 2. High-k deposition and materials characterization
- pt. 3. Challenge in interface engineering and electrode
- pt. 4. Development in non-Si-based CMOS technology
- pt. 5. High-k Application in novel devices
- pt. 6. Challenge and directions.