High-k gate dielectrics for CMOS technology
Gorde:
| Erakunde egilea: | |
|---|---|
| Beste egile batzuk: | , |
| Formatua: | Baliabide elektronikoa eBook |
| Hizkuntza: | ingelesa |
| Argitaratua: |
Weinheim :
Wiley-VCH,
2012.
|
| Gaiak: | |
| Sarrera elektronikoa: | An electronic book accessible through the World Wide Web; click to view |
| Etiketak: |
Etiketa erantsi
Etiketarik gabe, Izan zaitez lehena erregistro honi etiketa jartzen!
|
Aurkibidea:
- pt. 1. Scaling and challenging of Si-based CMOS
- pt. 2. High-k deposition and materials characterization
- pt. 3. Challenge in interface engineering and electrode
- pt. 4. Development in non-Si-based CMOS technology
- pt. 5. High-k Application in novel devices
- pt. 6. Challenge and directions.