High-k gate dielectrics for CMOS technology
Wedi'i Gadw mewn:
| Awdur Corfforaethol: | |
|---|---|
| Awduron Eraill: | , |
| Fformat: | Electronig eLyfr |
| Iaith: | Saesneg |
| Cyhoeddwyd: |
Weinheim :
Wiley-VCH,
2012.
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| Pynciau: | |
| Mynediad Ar-lein: | An electronic book accessible through the World Wide Web; click to view |
| Tagiau: |
Ychwanegu Tag
Dim Tagiau, Byddwch y cyntaf i dagio'r cofnod hwn!
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Tabl Cynhwysion:
- pt. 1. Scaling and challenging of Si-based CMOS
- pt. 2. High-k deposition and materials characterization
- pt. 3. Challenge in interface engineering and electrode
- pt. 4. Development in non-Si-based CMOS technology
- pt. 5. High-k Application in novel devices
- pt. 6. Challenge and directions.