Electrical Characterization of Nano-TiO2/Nb2O5 Composite Thin Films Deposited Using Electrophoretic Deposition Technique

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Main Author: Nguu J. N., Aduda B. O. , Nyongesa F. W., Musembi R. J. , Njogu S. M. & Mwathe P.M.
Format: Article
Language:English
Published: International Journal of Innovative Research in Advanced Engineering (IJIRAE) 2024
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Online Access:https://repository.daystar.ac.ke/handle/123456789/4516
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author Nguu J. N., Aduda B. O. , Nyongesa F. W., Musembi R. J. , Njogu S. M. & Mwathe P.M.
author_facet Nguu J. N., Aduda B. O. , Nyongesa F. W., Musembi R. J. , Njogu S. M. & Mwathe P.M.
author_sort Nguu J. N., Aduda B. O. , Nyongesa F. W., Musembi R. J. , Njogu S. M. & Mwathe P.M.
collection DSpace
description Journal Article
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id oai:repository.daystar.ac.ke:123456789-4516
institution Daystar University
language English
publishDate 2024
publisher International Journal of Innovative Research in Advanced Engineering (IJIRAE)
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spelling oai:repository.daystar.ac.ke:123456789-45162024-05-07T13:06:15Z Electrical Characterization of Nano-TiO2/Nb2O5 Composite Thin Films Deposited Using Electrophoretic Deposition Technique Nguu J. N., Aduda B. O. , Nyongesa F. W., Musembi R. J. , Njogu S. M. & Mwathe P.M. Electrical characterization TiO2/Nb2O5 composites Electrophoretic deposition thin films Hall Effect Journal Article This paper reports the results of electrical characterization of TiO2/Nb2O5 composite thin films. Uniform TiO2 and Nb2O5 composites thin films were deposited on FTO coated glass substrate using electrophoretic deposition (EPD) technique. The EPD voltage of 35V (DC) and deposition time of 90s, were used for various volume fractions of Nb2O5 in composites. Uniform and crack free composite films were successfully deposited using the EPD technique as shown by the SEM micrographs. The Hall Effect equipment was used to characterize the films through measurement of current and the Hall voltage. Current against Hall voltage plot for films of various volume fractions of Nb2O5 were used to determine Hall coefficients and majority charge carrier density. The sign of Hall coefficient values revealed that TiO2/Nb2O5 composite thin films had a net n-type polarity indicating electrons were the majority charge carrier in the composite films. The results showed that dye-sensitized solar cells should be fabricated with TiO2/Nb2O5 composites thin films in ratio of 1:1 because such ratio 1:1 for TiO2 and Nb2O5 in composite yielded the highest electron mobility in the films. 2024-05-07T13:01:10Z 2024-05-07T13:01:10Z 2015-02 Article Nguu J. N., Aduda B. O. , Nyongesa F. W., Musembi R. J. , Njogu S. M. & Mwathe P.M. (2015): Electrical Characterization of Nano-TiO2/Nb2O5 Composite Thin Films Deposited Using Electrophoretic Deposition Technique.: International Journal of Innovative Research in Advanced Engineering (IJIRAE). 2349-2163 https://repository.daystar.ac.ke/handle/123456789/4516 en Issue 2, Volume 2 application/pdf International Journal of Innovative Research in Advanced Engineering (IJIRAE)
spellingShingle Electrical characterization
TiO2/Nb2O5 composites
Electrophoretic deposition
thin films
Hall Effect
Nguu J. N., Aduda B. O. , Nyongesa F. W., Musembi R. J. , Njogu S. M. & Mwathe P.M.
Electrical Characterization of Nano-TiO2/Nb2O5 Composite Thin Films Deposited Using Electrophoretic Deposition Technique
title Electrical Characterization of Nano-TiO2/Nb2O5 Composite Thin Films Deposited Using Electrophoretic Deposition Technique
title_full Electrical Characterization of Nano-TiO2/Nb2O5 Composite Thin Films Deposited Using Electrophoretic Deposition Technique
title_fullStr Electrical Characterization of Nano-TiO2/Nb2O5 Composite Thin Films Deposited Using Electrophoretic Deposition Technique
title_full_unstemmed Electrical Characterization of Nano-TiO2/Nb2O5 Composite Thin Films Deposited Using Electrophoretic Deposition Technique
title_short Electrical Characterization of Nano-TiO2/Nb2O5 Composite Thin Films Deposited Using Electrophoretic Deposition Technique
title_sort electrical characterization of nano-tio2/nb2o5 composite thin films deposited using electrophoretic deposition technique
topic Electrical characterization
TiO2/Nb2O5 composites
Electrophoretic deposition
thin films
Hall Effect
url https://repository.daystar.ac.ke/handle/123456789/4516
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