Cita APA (7a ed.)
ebrary, Inc, He, G., & Sun, Z. (2012). High-k gate dielectrics for CMOS technology. Wiley-VCH.
Cita Chicago Style (17a ed.)
ebrary, Inc, Gang He, y Zhaoqi Sun. High-k Gate Dielectrics for CMOS Technology. Weinheim: Wiley-VCH, 2012.
Cita MLA (9a ed.)
ebrary, Inc, et al. High-k Gate Dielectrics for CMOS Technology. Wiley-VCH, 2012.
Precaución: Estas citas no son 100% exactas.