Silicon technologies ion implantation and thermal treatment /

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

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Bibliografski detalji
Autor kompanije: ebrary, Inc
Daljnji autori: Baudrant, Annie
Format: Elektronički e-knjiga
Jezik:engleski
Izdano: London : Hoboken, N.J. : ISTE ; Wiley, 2011.
Teme:
Online pristup:An electronic book accessible through the World Wide Web; click to view
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