Silicon technologies ion implantation and thermal treatment /

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

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Detalles Bibliográficos
Autor Corporativo: ebrary, Inc
Outros autores: Baudrant, Annie
Formato: Electrónico eBook
Idioma:inglés
Publicado: London : Hoboken, N.J. : ISTE ; Wiley, 2011.
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Acceso en liña:An electronic book accessible through the World Wide Web; click to view
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