Silicon technologies ion implantation and thermal treatment /
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Guardat en:
| Autor corporatiu: | |
|---|---|
| Altres autors: | |
| Format: | Electrònic eBook |
| Idioma: | anglès |
| Publicat: |
London : Hoboken, N.J. :
ISTE ; Wiley,
2011.
|
| Matèries: | |
| Accés en línia: | An electronic book accessible through the World Wide Web; click to view |
| Etiquetes: |
Afegir etiqueta
Sense etiquetes, Sigues el primer a etiquetar aquest registre!
|