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Silicon technologies ion implantation and thermal treatment /

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The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

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Bibliographic Details
Corporate Author: ebrary, Inc
Other Authors: Baudrant, Annie
Format: Electronic eBook
Language:English
Published: London : Hoboken, N.J. : ISTE ; Wiley, 2011.
Subjects:
Semiconductor doping.
Ion implantation.
Semiconductors > Heat treatment.
Electronic books.
Online Access:An electronic book accessible through the World Wide Web; click to view
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