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Silicon technologies ion implantation and thermal treatment /

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

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Podrobná bibliografie
Korporativní autor:	ebrary, Inc
Další autoři:	Baudrant, Annie
Médium:	Elektronický zdroj E-kniha
Jazyk:	angličtina
Vydáno:	London : Hoboken, N.J. : ISTE ; Wiley, 2011.
Témata:	Semiconductor doping. Ion implantation. Semiconductors > Heat treatment. Electronic books.
On-line přístup:	An electronic book accessible through the World Wide Web; click to view
Tagy:	Přidat tag Žádné tagy, Buďte první, kdo vytvoří štítek k tomuto záznamu!

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